The combination of several tools allow the fabrication of interesting structures. Standard lithography is a soft process based on organic masks that can't hold high temperatures. Good thermocromic VO2 requires a high temperature treatment to complete its crystalization, therfore a after lithography thermal treatment is needed to get the desired materials. Substoichiometric film of VO1.7 were deposited using pulsed laser deposition. 250 mTorr of O2 in 450 C completes the transformation.

a) The RBS energy spectrum (Backscattering of 1.8 MeV He⁺ ions) shows the samples are free of impurities.  b) A constant VO₂ stoichiometry is obtained down to 8 nm mass thickness. Electron micrographs of c) 15 and d)100 nm mass thickness films of VO₂ samples after oxidation where the initial smooth amorphous VO_1.7 film is traded by a VO₂ granular structure.